The DIGISEL in-situ laser ellipsometer provides a rapid, accurate
quality control solution for the deposition and etch of films in-situ.
The DIGISEL takes advantage of an advanced optical design that ensures accurate real-time calculation of the thickness and refractive index of single layer films in-situ.
The compact ellipsometric heads are easily mounted onto CVD, electron-beam, MBE, sputtering as well as any other chamber that has an entrance and exit window for the measuring beam.
The DIGISEL is simple to operate and adaptable to many types of processes, and is the tool of choice for simplifying everyday process characterization and development for demanding research and industrial quality control applications.
Key Applications
The DIGISEL in-situ ellipsometer is routinely used for:
- Thickness monitoring
- Growth and etch rates
- Endpoint detection
- Surface damage
- Contamination
Due to its very high sensitivity in-situ ellipsometry is ideal for investigating any change in surface properties, such as oxide formation, chemisorption, surface contamination or protein adsorption very accurately, in real-time.
Inclusion of the DIGISEL as part of a process monitoring system supplies precise thin film process information for a competitive edge in a vast array of applications. The DIGISEL may be included with the MultiCPM process metrology platform, and used together with the DIGILEM interferometric end point detection system, and DIGICPM optical emission system.
