Advanced Thin Film Metrology Tool
- Highest accuracy and precision
- 30 µm achromatic microspot
- DUV 190 nm range
- Advanced automation features
- Designed for advanced thin film characterization
The UT-300 - Fully Automatic Spectroscopic Ellipsometer is specially developed to provide specific process control solutions for the semiconductor industry.
Equipped with achromatic microspot optics, wafer handling system, autofocus and pattern recognition software the UT-300 provides unique capabilities for analyzing demanding thin film structures at a throughput in excess of 100 wafers/hour. The instrument has a far-UV option (190 nm) and is compatible with 6", 8" and 12" wafers.
The UT-300 spectroscopic ellipsometer presents high level of performance in terms of accuracy and stability tailored for qualification and on-line production control.
The integrated DeltaPsi2 software package has been designed to process ellipsometric data simply and reliably. Routine tasks are performed fully automatically to meet production needs.
Characterization
of thickness and optical constants of thin films and multilayer
stacks for: |
Complex
material properties |
Fast uniformity mapping |
