The advanced optical design of the UVISEL FUV integrates high throughput optics and provides an extremely low level of stray light. The UVISEL FUV spectroscopic ellipsometer is recognized to provide high accuracy measurement and the best signal to noise ratio in the FUV range even for low reflecting samples.
The UVISEL FUV is the ideal tool for:
- Semiconductor
- Lithography
- Data storage
- Chemical and biological engineering
- Display devices
|
Characterization
of thickness and optical constants in the VIS-FUV spectral
range of thin films and multilayer stacks for: |
High sensitivity for the measurements of ultra-thin films, films with low index contrast and complex films exhibiting gradient or anisotropy |
