It uses a very high spectral resolution monochromator (HR-460) automatically controlled (choice of gratings, slits and detectors) for continuous measurements over the whole range. The VIS range is covered by a photomultiplier detector while the NIR range uses an InGaAs photodiode.
The spectral range of a spectroscopic ellipsometer is very important as it determines the possible applications. The NIR range provides two main advantages:
- Longer wavelengths ensure a transparent region for thickness measurements of all the materials absorbing in the visible range.
- The accuracy for the characterization of thick films is enhanced.
The UVISEL NIR is mainly dedicated to semiconductor, optical coatings, optoelectronic and telecommunication applications.
|
Characterization of thickness and optical constants in the NIR-VIS
spectral range of thin films and multilayer stacks for:
|
Determination of compound alloy composition |
Characterization of silicon crystallinity |
NIR applications at special common wavelengths (1550, 1300,. nm) |
Measurement of thick films up to 40 µm |
Material properties: graded, anisotropic, porous layers. |
